CMA Series Polishing Fluid High Dirt Holding Filter Cartridge for semiconductor and electronics applications.

CMA Series polishing fluid high dirt holding filter cartridge is designed for the filtration of bulk particles and colloids in oxide CMP, tungsten CMP, and copper CMP processes.

This series uses gradient treatment and a unique gradual pore size design. The pore size gradually decreases from outside to inside, allowing large particles and agglomerates to be captured while useful polishing particles can pass through. This structure helps improve filtration efficiency, increase dirt holding space, reduce clogging, and extend filter service life.

With all-polypropylene construction, low precipitation, broad chemical compatibility, and optional micron ratings from 0.1 μm to 90 μm, CMA Series is suitable for different polishing liquid filtration requirements.

• Gradient Filtration Structure

  The pore size of the filter media gradually decreases from outside to inside. This structure helps trap large particles and release effective polishing particles, providing a larger effective filtration area and higher dirt holding capacity.

  Low Precipitation

  The cartridge is made with all-PP construction and produced without adhesives or surfactants. This helps reduce precipitation and leaching risks during filtration.

  Broad Chemical Compatibility

  The polypropylene structure provides good chemical compatibility and is suitable for filtration of various polishing liquids and process fluids.

  Optional Multiple Micron Ratings and Interfaces

  Micron ratings from 0.1 μm to 90 μm are available to meet different polishing process requirements. Different lengths and interface types can also be customized for use with different filter housings.

Compared with ordinary PP filter cartridges, CMA Series is specially designed for polishing liquid and CMP slurry filtration. Its gradient filtration structure helps capture large particles while maintaining effective polishing components in the liquid.

The high dirt holding capacity can reduce blockage, extend service life, and lower filter replacement frequency. The all-PP adhesive-free structure also helps control precipitation and improve process cleanliness.

We provide comprehensive technical support for installation, operation, and maintenance, including filter replacement guidance and maintenance recommendations. Complete documentation includes user manuals, installation guides, and troubleshooting notes.

Shanghai Pullner Filtration Technology Co., Ltd. was established in May 2011 with a registered capital of RMB 26 million. The company operates a Class 100,000 cleanroom workshop (3,000 m²) and an on-site Class 1,000 clean laboratory, integrating R&D, manufacturing, and sales of microporous membrane filtration equipment and filtration systems.

Pullner products are widely applied in microelectronics, fine chemicals, new energy, seawater desalination, biotech, and laboratory fields, including LCD panels, semiconductor processing, high-purity chemicals, condensate filtration, and reclaimed water reuse.

The company holds ISO9001 / ISO14001 / ISO45001 certificates, is recognized as a high-tech enterprise, and owns multiple patents. Pullner is also an approved vendor of Saudi Aramco.